A direct-write lithography system that uses an electron beam for nanoscale patterning. The system is based on a Schottky field-emission SEM equipped with beam-blanking hardware and dedicated control software.
JSM-7200F with a Deben blanker and an NPGS (nanometer pattern generating system)
10-20 nm minimum feature size at 25 pA beam current and 30kV accelerating voltage
100-micron square standard writing field size