As a key part of the photolithography process, the Mask Aligner can perform the precise alignment of photomask and substrate that is needed for creation of microscale structures.
Topside alignment and backside alignment
Substrate sizes from 1” to 150mm diameter
Mask sizes from 2.5” X 2.5” to 7” X 7”
10mm maximum substrate thickness
For use with i-line resists