Nanofabrication Facility

Clean Room Equipment

Cee X-Pro II Workstation

Specifications

Filmetrics F20-UVX Thin Film Measurement System

Specifications

Heidelberg Instruments μMLA Maskless Alignment System

Specifications

Kurt J. Lesker Company Evaporation System

Specifications

Kurt J. Lesker Company PRO Line PVD 75 Sputter System

Specifications

LM Air Technology Polypropylene Fume Hood/Wet Bench

Specifications

Olympus MX63 Inspection Microscope

Specifications

SAMCO RIE-10NR Reactive Ion Etch System

Specifications

SUSS MicroTec MA/BA6 Mask Alignment System

Specifications